CVD synthesis of multi-layered polycrystalline diamond films with reduced roughness using time-limited injections of N2 gas

Multi-layered polycrystalline diamond (PCD) films were synthesized using microwave plasma-assisted chemical vapor deposition (CVD) with periodical addition (injections) of N 2 gas to the standard CH 4 -H mixture. The aim such an approach was reduce roughness while preserving overall high quality and phase purity PCD material. thicknesses in range 5 51 ?m, number layers from 1 15. introduction even smallest amount nitrogen leads a significant (more than 2-fold) increase growth rate films. Optimized injection regimes allowed reduction relative (S q /thickness) by more 3 times comparison microcrystalline film grown under similar conditions without addition. proposed method periodic during restricted formation continuous NCD layers, which improved sp3/sp2 ratio multi-layered MCD/NCD materials. obtained materials reduced may be used for protective hard covers, optical coatings, electrochemical thermal management applications. plasma CVD short-term injections process gas; average is doubled owing pulsed injection, surface (no injection) film. • are injections. Surface single-layer Average injection.